Obducat AB
Obducat AB: Second NIL patent granted in China
Corporate-news transmitted by DGAP.
The issuer is solely responsible for the content of this announcement.
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Obducat AB: Second NIL patent granted in China
Malmö, October 4, 2005 – Obducat has received a second NIL patent granted in
China. The patent concerns an important functionality within the nano imprint
lithography (NIL) technique called parallelization.
The patent focuses on so-called parallelization, which facilitates a high
quality result from the nano imprint lithography process where a pattern is
transferred from a so-called stamper to a substrate. The function enables an
even force distribution over a larger area, which leads to a higher cost
efficiency from a manufacturing perspective.
Patrik Lundstöm, CEO Obducat, comments: “We recently received our first NIL
patent granted in China and the fact that we now have received yet another
crucial patent approved in China means that we will strengthen our position
even further which fits well with our long term interest in the Chinese
market.”
For further information please contact:
Patrik Lundström, CEO, +46 40 36 21 00 or +46 703 27 37 38
Obducat AB is an innovative developer and supplier of technologies, products
and processes used for the production and replication of advanced micro and
nano structures. Obducat’s products and services are intended to serve the
demands of companies within the information storage, semiconductor, printed
circuit board, and sensor industries. Obducat’s technologies include electron
beam and nano imprint technology. Obducat has offices in Sweden and the UK,
with the head quarters located in Malmö, Sweden. The Obducat shares are
publicly traded on the Swedish NGM stock exchange.
Read more at http://www.obducat.com
End of announcement (c)DGAP 04.10.2005
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WKN: 922032; ISIN: SE0000514705; Index:
Listed: Freiverkehr in Berlin-Bremen, Frankfurt, München und Stuttgart
041355 Okt 05
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