Obducat AB
Obducat attains critical process patent in Japan
Corporate News transmitted by DGAP – a company of EquityStory AG.
The issuer is solely responsible for the content of this announcement.
——————————————————————————
Obducat attains critical process patent in Japan
Malmö, November 24th, 2006 – OBDUCAT AB, the world’s leading provider of
lithography solutions based on Nano Imprint Lithography (NIL) and Electron
Beam Lithography (EBL), has learned that the Japaneese patent authority
will be awarding Obducat a patent of significant importance for the
Company’s further canvassing of the market in Japan. The patent covers an
element of the NIL technique that facilitates and streamlines both the
stamper production and the pattern transfer process. This technique plays a
particularly important role for components such as polarisation filters and
high intensity diodes.
The invention focuses on a so-called multilayer principle, which means that
several layers of polymers with different functions and properties are
built on top of one another. These layers react in different ways during
the imprint process and subsequent processes. The method enables Obducat to
tailor the choice of polymers in order to meet the demands of the process
steps that follow. This results in a production process that allows for a
higher tolerance level when fabricating very small structures, while at the
same time enabling production of structures with high aspect ratio.
‘Each patent is a milestone for Obducat, and in the long run also very
important for the nano imprint lithography technique and thereby for
Obducat’s position on the market. The patented invention further increases
our opportunities to deliver a highly customised lithography solution to
our customers, also allowing the cost-efficiency of the total solution to
be optimised. This further strengthens the overall competitive advantage
offered by NIL, and by Obducat, compared with alternative suppliers’, says
Patrik Lundström, CEO at Obducat AB.
For further information, please contact:
Patrik Lundström, CEO, +46 40 – 36 21 00 or 703 – 27 37 38
Henri Bergstrand, Chariman of the Board, +46 40-36 21 00 or 708 – 88 72 45
Obducat AB is an innovative developer and supplier of technologies,
products and processes used for the production and replication of advanced
micro and nano structures. Obducat’s products and services are intended to
serve the demands of companies within the information storage,
semiconductor, printed circuit board, and sensor industries. Obducat’s
technologies include electron beam and nano imprint technology. Obducat has
offices in Sweden and the UK, with the head quarters located in Malmö,
Sweden. The Obducat shares are publicly traded on the Swedish NGM stock
exchange. Read more at www.obducat.com
Patrik Lundström, CEO, +46 (40) 36 21 00 or +46 (703) 27 37 38
Henri Bergstrand, Chairman of the Board, +46 (40) 36 21 00 or +46 (708) 88
72 45
(c)DGAP 24.11.2006
—————————————————————————
Latest News
Latest Reports
No Reports found
Upcoming Events
No Events found
Webcasts
No Webcasts found